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掩模的完整性對高標準光刻工藝的成功起主要作用。masktrack pro 掩膜清洗處理系統(tǒng)滿足下一代光刻節(jié)點在掩模清洗、烘烤和顯影工藝方面的所有標準。它是應對 193i 1x half-pitch dpt、紫外光刻 (euvl) 和納米壓印光刻 (nil)高要求的創(chuàng)新解決方案。以創(chuàng)新技術大限度地提高光掩模性能。
更新時間:2025-09-09
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